@article{ref1,
title="Chromium as an antidiffusion interlayer in higher manganese silicide-nickel contacts",
journal="Technical Physics",
year="2000",
author="Petrova, L.I. and Dudkin, L.D. and Khlomov, V.S. and Fedorov, M.I. and Zaǐtsev, V.K. and Solomkin, F.Yu.",
volume="45",
number="5",
pages="641-643",
abstract="The interaction of higher manganese suicide (MnSi1.71-1.75) with nickel and chromium was investigated. A chromium layer was shown to inhibit nickel diffusion into suicide more than four times. The use of the chromium layer made it possible to improve the mechanical and electrical properties of silicide-nickel contacts. © 2000 MAIK &quot;Nauka/Interperiodica&quot;.<p /><p>Language: en</p>",
language="en",
issn="1063-7842",
doi="10.1134/1.1259692",
url="http://dx.doi.org/10.1134/1.1259692"
}