@article{ref1,
title="UHV study of hydrogen atom induced etching of amorphous hydrogenated silicon thin films",
journal="The journal of physical chemistry. B",
year="2001",
author="Zechcjf, T. and Brandnei, B.D. and Biener, J. and Küppers, J.",
volume="105",
number="17",
pages="3502-3509",
abstract="<p>[Abstract unavailable]</p><p>Language: en</p>",
language="en",
issn="1520-6106",
doi="10.1021/jp0022611",
url="http://dx.doi.org/10.1021/jp0022611"
}