@article{ref1,
title="Evolution of surface roughness during metal suicides phase transformation",
journal="Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films",
year="2004",
author="Pang, C.H. and Hing, P. and Zhao, F.F. and See, A. and Chong, Y.F. and Lee, P.S.",
volume="22",
number="1",
pages="122-128",
abstract="The evolution of surface roughness during metal silicides phase transformation and coupling was discussed. The correlation of surface roughness with sheet resistance, film thickness and phase transformation were also studied. The results show that during metal/silicon reaction film surface roughness is due to the effect of nucleation and growth of metal silicides. It was also found that surface roughness increases as new phase are formed and decreases during grain growth.<p /><p>Language: en</p>",
language="en",
issn="0734-2101",
doi="10.1116/1.1636158",
url="http://dx.doi.org/10.1116/1.1636158"
}