TY  - JOUR
PY  - 2004//
TI  - Evolution of the Co-N/Ti/Si system in magnetron sputtering of Co onto a heated Ti/Si(100) substrate
JO  - Russian Microelectronics
A1  - Vasiliev, A.G.
A1  - Vasiliev, A.L.
A1  - Zakharov, R.A.
A1  - Orlikovsky, A.A.
A1  - Horin, I.A.
A1  - Eindou, M.
SP  - 1
EP  - 6
VL  - 33
IS  - 1
N2  - The surface-diffusion interaction is studied experimentally between cobalt and a heated Ti/Si(100) substrate under reactive magnetron sputtering in an argon-nitrogen atmosphere. A model is proposed that accounts for the nature of suicide formation in the Co/Ti/Si system by volume and surface-diffusion reactions between cobalt and the substrate. It is shown that the diffusion of cobalt into the silicon is impeded by the TiSix layer to a far greater extent than by the Ti layer.<p /> <p>Language: en</p>
LA  - en
SN  - 1063-7397
UR  - http://dx.doi.org/10.1023/B:RUMI.0000011093.63543.a8
ID  - ref1
ER  -