Article Title,Year,Volume,Issue,Page Range,Author
A structural and compositional analysis of a TiOx diffusion barrier for indium Tin Oxide/Si contacts,2008,14,4,481-485,Kim
Microstructure evolution of the Ir-inserted Ni suicides with additional annealing,2009,15,1,69-76,Song
Properties of nickel-cobalt composite silicides by thermal annealing of Ni1-xCox(x = 0.2 0.5 and 0.8) alloy thin films on silicon and polysilicon substrates,2007,13,3,239-247,Kim
Properties of iridium-inserted nickel silicides by thermal annealing of the Ni/Ir bilayer on silicon and polysilicon substrates,2007,13,3,229-234,Song