Citation

Myrillas K, Gosset A, Rambaud P, Anderhuber M, Mataigne JM, Buchlin JM. Chem Eng Process 2011; 50(5-6): 466-470.

Copyright

(Copyright © 2011, Elsevier Publishing)

DOI

10.1016/j.cep.2010.09.011

PMID

unavailable

Abstract

The current study presents an experimental investigation of a technique for delaying the occurrence of splashing in jet wiping process by means of a side jet. Gas jet wiping is a hydrodynamic method of controlling the film thickness applied on a substrate in coating processes. It consists of a turbulent slot jet impinging on a moving surface coated with a liquid film. The process is limited by splashing; a rather violent film instability which is characterized by the ejection of droplets from the runback flow and results in the detachment of the film from the substrate. In the present study an additional side jet is used close to the main wiping jet in order to stabilize the runback flow and avoid splashing. The mean film thickness after wiping is measured using a light absorption method and the results are compared for the single jet wiping and two jet configuration. It is shown that the use of the side jet allows for stronger wiping, resulting in lower values of the final film thickness which cannot be achieved with a single jet. 2010 Elsevier B.V.